La/B4C multilayer mirrors for x-rays below 190 eV

被引：5

作者：

Michaelsen, C ^{[1
]}

Wiesmann, J ^{[1
]}

Bormann, R ^{[1
]}

Nowak, C ^{[1
]}

Dieker, C ^{[1
]}

Hollensteiner, S ^{[1
]}

Jäger, W ^{[1
]}

机构：

[1] GKSS Forschungszentrum Geesthacht GmbH, HASYLAB, D-21502 Geesthacht, Germany

来源：

X-RAY MIRRORS, CRYSTALS AND MULTILAYERS | 2001年 / 4501卷

关键词：

X-ray multilayer mirrors; soft x-rays; La/B4C; synchrotron reflectometry; x-ray spectrometry; boron detection;

D O I：

10.1117/12.448486

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have fabricated La/B4C multilayer films by magnetron sputtering for the use as x-ray mirrors at energies below 190 eV, particularly for the detection of boron Kalpha x-rays at 183 eV, and compared them to Mo/B4C multilayers that are currently used in x-ray fluorescence spectrometers for this purpose. Transmission electron microscopy and synchrotron soft x-ray reflectometry at energies between 50 and 525 eV were used to study the structural quality and the x-ray optical performance of the multilayers. The results show a significant improvement of the reflectance at 183 eV with simultaneously improved suppression of other, undesired x-ray energies, indicating that La/B4C has a high potential to replace Mo/B4C in many x-ray optical applications below 190 eV. As an example, a comparison between La/B4C and Mo/B4C multilayers was performed by laboratory x-ray fluorescence measurements of the boron Ka emission using samples of B4C and borophosphosilicate glass. The improvements of the peak intensity and the lower limit of detection amounted to about 64% and 29%, respectively. The thermal stability of La/B4C multilayers was also investigated.

引用

页码：135 / 141

页数：7

共 11 条

[1] First observation of self-amplified spontaneous emission in a free-electron laser at 109 nm wavelength [J].

Andruszkow, J ;

Aune, B ;

Ayvazyan, V ;

Baboi, N ;

Bakker, R ;

Balakin, V ;

Barni, D ;

Bazhan, A ;

Bernard, M ;

Bosotti, A ;

Bourdon, JC ;

Brefeld, W ;

Brinkmann, R ;

Buhler, S ;

Carneiro, JP ;

Castellano, M ;

Castro, P ;

Catani, L ;

Chel, S ;

Cho, Y ;

Choroba, S ;

Colby, ER ;

Decking, W ;

Den Hartog, P ;

Desmons, M ;

Dohlus, M ;

Edwards, D ;

Edwards, HT ;

Faatz, B ;

Feldhaus, J ;

Ferrario, M ;

Fitch, MJ ;

Flöttmann, K ;

Fouaidy, M ;

Gamp, A ;

Garvey, T ;

Gerth, C ;

Geitz, M ;

Gluskin, E ;

Gretchko, V ;

Hahn, U ;

Hartung, WH ;

Hubert, D ;

Hüning, M ;

Ischebek, R ;

Jablonka, M ;

Joly, JM ;

Juillard, M ;

Junquera, T ;

Jurkiewicz, P .

PHYSICAL REVIEW LETTERS, 2000, 85 (18) :3825-3829

[2] X-RAY INTERACTIONS - PHOTOABSORPTION, SCATTERING, TRANSMISSION, AND REFLECTION AT E=50-30,000 EV, Z=1-92 [J].

HENKE, BL ;

GULLIKSON, EM ;

DAVIS, JC .

ATOMIC DATA AND NUCLEAR DATA TABLES, 1993, 54 (02) :181-342

[3] MASKED DEPOSITION TECHNIQUES FOR ACHIEVING MULTILAYER PERIOD VARIATIONS REQUIRED FOR SHORT-WAVELENGTH (68-ANGSTROM) SOFT-X-RAY IMAGING OPTICS [J].

KORTRIGHT, JB ;

GULLIKSON, EM ;

DENHAM, PE .

APPLIED OPTICS, 1993, 32 (34) :6961-6968

[4] Multilayer mirror for x rays below 190 eV [J].

Michaelsen, C ;

Wiesmann, J ;

Bormann, R ;

Nowak, C ;

Dieker, C ;

Hollensteiner, S ;

Jäger, W .

OPTICS LETTERS, 2001, 26 (11) :792-794

[5]

Michaelsen C., 1998, ADV XRAY ANAL, V42, P308

[6]

MICHAELSEN C, Patent No. 00756462

[7] Survey of Ti-, B-, and Y-based soft x-ray-extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region [J].

Montcalm, C ;

Kearney, PA ;

Slaughter, JM ;

Sullivan, BT ;

Chaker, M ;

Pepin, H ;

Falco, CM .

APPLIED OPTICS, 1996, 35 (25) :5134-5147

[8] Improved analyzer multilayers for aluminium and boron detection with x-ray fluorescence [J].

Ricardo, P ;

Wiesmann, J ;

Nowak, C ;

Michaelsen, C ;

Bormann, R .

APPLIED OPTICS, 2001, 40 (16) :2747-2754

[9]

Spiller E., 1994, SOFT XRAY OPTICS

[10] MULTILAYER MIRROR TECHNOLOGY FOR SOFT-X-RAY PROJECTION LITHOGRAPHY [J].

STEARNS, DG ;

ROSEN, RS ;

VERNON, SP .

APPLIED OPTICS, 1993, 32 (34) :6952-6960

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