Antiferromagnetism and p-type conductivity of nonstoichiometric nickel oxide thin films

被引：25

作者：

Napari, Mari ^{[1
,4
]}

Huq, Tahmida N. ^{[1
]}

Maity, Tuhin ^{[1
]}

Gomersall, Daisy ^{[2
]}

Niang, Kham M. ^{[2
]}

Barthel, Armin ^{[1
]}

Thompson, Juliet E. ^{[1
]}

Kinnunen, Sami ^{[3
]}

Arstila, Kai ^{[3
]}

Sajavaara, Timo ^{[3
]}

Hoye, Robert L. Z. ^{[1
]}

Flewitt, Andrew J. ^{[2
]}

MacManus-Driscoll, Judith L. ^{[1
]}

机构：

[1] Univ Cambridge, Dept Mat Sci & Met, Cambridge, England

[2] Univ Cambridge, Elect Engn Div, Dept Engn, Cambridge, England

[3] Univ Jyvaskyla, Dept Phys, Jyvaskyla, Finland

[4] Univ Southampton, Zepler Inst Photon & Nanoelect, Southampton, Hants, England

来源：

INFOMAT | 2020年 / 2卷 / 04期

基金：

欧盟地平线“2020”; 英国工程与自然科学研究理事会;

关键词：

atomic layer deposition; chemical vapor deposition; nickel oxide; solution deposition; thin films; ATOMIC LAYER DEPOSITION; NIO FILMS; TRANSPORT; TEMPERATURE; PRECURSOR; CO;

D O I：

10.1002/inf2.12076

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：769 / 774

页数：6

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