Dip-pen nanolithography (DPN) relies on the compatibility between the ink used and the substrate it is written on. This has lead to a significant reliance for DPN on thiol-gold chemistries for the fabrication of nanostructures. This reported work demonstrates a method for creating nanostructures through nanotemplates that allows a wider range of substrates and inks to be used. The substrate was spin-coated with a thin layer of polymer which is selectively removed using a scanning probe microscopy tip coated with a solvent. This produces nanotemplates that are subsequently used to create nanostructures by metallisation. Compared with directly written templates these nanotemplates facilitate longer interaction between inking material and the substrate. They also allow a controlled spatial resolution along the z-axis and eliminate the need for any blocking agents to prevent non-specific adsorption. This method allows DPN to be expanded to applications beyond thiol-gold chemistries.
机构:
Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USAGeorgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Nelson, BA
King, WP
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机构:Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
King, WP
Laracuente, AR
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机构:Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Laracuente, AR
Sheehan, PE
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机构:Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA
Sheehan, PE
Whitman, LJ
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机构:Georgia Inst Technol, George W Woodruff Sch Mech Engn, Atlanta, GA 30332 USA