The effects of chloride ions and benzotriazole on photoresponses of copper electrodes

被引:12
作者
Hao, YZ
Yang, MZ [1 ]
Yu, C
Cai, SM
Zhou, GD
机构
[1] Peking Univ, Coll Chem & Mol Engn, Beijing 100871, Peoples R China
[2] Shanghai Inst Elect Power, Electrochem Res Grp, Shanghai 200090, Peoples R China
基金
中国国家自然科学基金;
关键词
copper; corrosion; inhibitor; photoelectrochemistry;
D O I
10.1016/S0040-6090(98)01745-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effects of chloride ions (Cl-) and benzotriazole (BTA) on a Cu electrode in weakly acidic solution (pH 5.6) and borax buffer solution (pH 8.5) were investigated by measuring the photopotentials, the photocurrent as a function of electrode potential and the intensity modulated photocurrent spectra (IMPS) of the Cu electrode. The photoresponse transition from p-type to n-type was observed in both chloride-containing media and borax buffer containing 0.1 mg/l BTA or above. The photoresponse originated from Cu2O film on the surface of the Cu electrode. The doping of Cl- in the Cu2O film was responsible for the photoresponse transition of the Cu electrode in chloride-containing media. When BTA was added to the solutions, the compact Cu-BTA film was formed and blocked the intrusive ions into the underlying Cu2O film. However, a photoresponse transition was observed with the increase in BTA concentration in borax buffer solutions, It was concluded that the co-existence of heterogeneous p-type region and n-type region in Cu2O film underlayer resulted in the photoresponse transition. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
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页码:289 / 294
页数:6
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