Comparison of Shack-Hartmann sensor and Point Diffraction Interferometer for Wavefront Aberration analysis

被引：0

作者：

Marzoa, A. ^{[1
]}

Bosch, S. ^{[1
]}

Vallmitjana, S. ^{[1
]}

机构：

[1] Univ Barcelona, Fac Phys, Dept Appl Phys, Barcelona, Spain

来源：

2016 15TH WORKSHOP ON INFORMATION OPTICS (WIO) | 2016年

关键词：

wavefront; aberration; optical testing; Zernike polynomials; Shack-Hartmann; Point diffraction interferometer;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Two methods for assessing the image quality of optical systems based on the analysis of wavefront aberration (WA) are presented together. The methods and the experimental setups are broadly described. A comparative study between those two techniques on the analysis of a meniscus lens has been carried out and an equivalence between both techniques has been tested and demonstrated, by comparing the RMS associated to their measured Zernike coefficients.

引用

页数：3

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