Radiation Effects on LiNbO2 Memristors for Neuromorphic Computing Applications

被引:13
|
作者
Greenlee, Jordan D. [1 ]
Shank, Joshua C. [1 ]
Tellekamp, M. Brooks [1 ]
Zhang, En Xia [2 ]
Bi, Jinshun [2 ]
Fleetwood, Daniel M. [2 ]
Alles, Michael L. [2 ]
Schrimpf, Ronald D. [2 ]
Doolittle, W. Alan [1 ]
机构
[1] Georgia Inst Technol, Elect & Comp Engn Dept, Atlanta, GA 30332 USA
[2] Vanderbilt Univ, Dept Elect Engn & Comp Sci, Nashville, TN 37235 USA
关键词
Analog memristor; lithium niobite; proton radiation; total ionizing dose; X-ray radiation; THIN-FILMS; MEMORY; RESISTANCE; INTERCALATION; IRRADIATION; DYNAMICS; PROTON;
D O I
10.1109/TNS.2013.2288218
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effects of X-ray and proton radiation on a LiNbO2 analog memristor are investigated by I-V hysteresis, Electrochemical Impedance Spectroscopy, low-frequency AC voltage, and X-ray diffraction analysis. Both electrical and structural characterization of an irradiated memristor show that irradiation leads to an increased level of defects in the LiNbO2 crystalline lattice. These radiation-induced defects facilitate faster lithium movement as shown by electrochemical impedance spectroscopy measurements on the as-grown and irradiated memristor. X-ray radiation improves ionic motion in the bulk of the device and increases the ionic resistance at the LiNbO2-metal interface. In the case of proton radiation, the memristance response improves due to an increase in ionic motion in the bulk and at the interfaces. It is also shown by Monte Carlo simulations that proton irradiation of LiNbO2 results in structural damage, which was verified experimentally by an X-ray diffraction study.
引用
收藏
页码:4555 / 4562
页数:8
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