Nanoindentation studies of Cu-W alloy films prepared by magnetron sputtering

被引：35

作者：

Zong, R. L. ^{[1
]}

Wen, S. P. ^{[1
]}

Zeng, F. ^{[1
]}

Gao, Y. ^{[1
]}

Pan, F. ^{[1
]}

机构：

[1] Tsinghua Univ, Dept Mat Sci & Engn, Adv Mat Lab, Beijing 100084, Peoples R China

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2008年 / 464卷 / 1-2期

关键词：

Cu-W system; amorphous; nanoindentation; mechanical properties;

D O I：

10.1016/j.jallcom.2007.10.033

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Cu-W alloy films were prepared by magnetron sputtering. Their microstructure, hardness, elastic modulus and plastic deformation were investigated by various technologies. The results show that Cu-W amorphous alloy films are formed in the composition range from Cu36W64 to Cu75W25, and out of this range solid solutions are formed. Both the hardness and elastic modulus of Cu-W amorphous alloy films are lower than their rule-of-mixture values. The load-displacement curves of Cu-W amorphous alloys with lower Cu content exhibit obvious serrated flow at lower strain rate. Serrations are suppressed at higher strain rate and higher Cu content. For all Cu-W amorphous alloy films, shear bands are observed and their number and density increase with increasing Cu content. indicating that the details of the plastic deformation of Cu-W amorphous alloys arc material-related. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：544 / 549

页数：6

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