A study on property of degradation between the insulation semiconducting layer in 22kV CV power cable

被引:0
作者
Kang, MS
Kim, DS
Jung, SY
Park, DH
Lim, KJ
机构
来源
JOINT CONFERENCE OF 96' AICDEI / 4T-JCCEID | 1996年
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this study, the insulation selected in aged 22kV XLPE for power cable has been observed and aging process about the insulation has been investigated. Most insulation aging process initiates in the interface of semiconducting layer and the type of the process is the fractal form that was observed between the the semiconducting layer and insulation layer. It is possible to estimate degree of the degradation of cable with breakdown test and obtained data have been used to get parameters in order to use Weibull distribution. With this method it is considered to be possible to estimate situation of degradation and life performance.
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页码:219 / 222
页数:4
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