Simultaneous molecular beam epitaxy growth at multiple uniform substrate temperatures

A substrate holder is demonstrated for molecular beam epitaxy (MBE) growth at four calibrated substrate temperatures in the same growth run. On a standard 3-in. substrate block, the substrate face plate can hold simultaneously four substrates, each at a uniform and isolated temperature. The samples are otherwise under identical growth conditions, providing a fourfold increase in sample throughput per growth run. Therefore, the multi-temperature-zone substrate holder is particularly suited for materials research and development by MBE, where it enables rapid mapping of the growth phase diagram. Published by the AVS.