Quantum Mechanical Study of the Germanium Electron-Hole Bilayer Tunnel FET

被引:41
作者
Alper, Cem [1 ]
Lattanzio, Livio [1 ]
De Michielis, Luca [1 ]
Palestri, Pierpaolo [2 ]
Selmi, Luca [2 ]
Ionescu, Adrian Mihai [1 ]
机构
[1] Ecole Polytech Fed Lausanne, Nanoelect Devices Lab, CH-1015 Lausanne, Switzerland
[2] Univ Udine, Dipartimento Ingn Elettr Gest & Meccan, I-33100 Udine, Italy
关键词
2-D-2-D tunneling; band-to-band tunneling (BTBT); density of states (DOS); electron-hole bilayer tunnel field-effect transistor (EHBTFET); germanium; quantum mechanical (QM) simulation; subthreshold slope; tunnel field-effect transistor (TFET);
D O I
10.1109/TED.2013.2274198
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electron-hole bilayer tunnel field-effect transistor (EHBTFET) is an electronic switch that uses 2-D-2-D sub-band-to-sub-band tunneling (BTBT) between electron and hole inversion layers and shows significant subthermal swing over several decades of current due to the step-like 2-D density of states behavior. In this paper, EHBTFET has been simulated using a quantum mechanical model. The model results are compared against transactions on computer-aided design simulations and remarkable differences show the importance of quantum effects and dimensionality in this device. Ge EHBTFET with channel thickness of 10 nm results as a promising device for low supply voltage, subthreshold logic applications, with a super steep switching behavior featuring SSavg similar to 40 mV/dec up to V-DD. Furthermore, it has been demonstrated that high ON current levels (similar to 40 mu A/mu m) can be achieved due to the transition from phonon-assisted BTBT to direct BTBT at higher biases.
引用
收藏
页码:2754 / 2760
页数:7
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