Study of micro-lens array by reflow process

被引:17
作者
Pan, C. T. [2 ,3 ]
Su, C. Y. [1 ]
机构
[1] Natl Taipei Univ Technol, Inst Mfg Technol, Taipei, Taiwan
[2] Natl Sun Yat Sen Univ, Dept Mech & Electromech Engn, Kaohsiung, Taiwan
[3] Natl Sun Yat Sen Univ, Ctr Nanosci & Nanotechnol, Kaohsiung, Taiwan
关键词
micro-lens; focal length; embossing; alloy electroplating; reflow;
D O I
10.1080/09500340802226536
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this study, different diameters of photoresist AZ4620 are defined using lithography. According to the specification of the back light module (BLM) for a liquid crystal display (LCD), the diameters of micro-lenses are divided into two groups. The first group includes lenses with diameters of 90, 95, 100, 105, 110 and 150 mu m at a 100 mu m pitch; the reflow temperatures for this first group range from 175-300 degrees C with heating times of 6-24h. The second group includes lenses with diameters of 10, 20, 30, 40, and 50 mu m at pitches of 40, 30, 20, 10, and 25 mu m, respectively; the reflow temperatures are the same as for the first group with heating times of 1-12h. In this study, the parametric effects of reflow time and temperature on micro-opticals are characterized and discussed, and optical properties such as the focal length of micro-lenses are measured and analyzed. Then, each micro-lens is sputtered with a conductive seed layer of silver (Ag) for the subsequent eletroforming process, which is the mold for hot embossing. The mold is further incorporated with hot embossing materials and hot embossing techniques to produce the micro-lens required.
引用
收藏
页码:2843 / 2856
页数:14
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