Mechanical stress induced polarization reorientation in polycrystalline Bi3.25La0.75Ti3O12 films

被引：4

作者：

Kan, Yi ^{[1
]}

Liu, Yunfei ^{[1
]}

Mieth, Oliver ^{[2
]}

Bo, Huifeng ^{[1
]}

Wu, Xiumei ^{[3
]}

Lu, Xiaomei ^{[1
]}

Eng, Lukas M. ^{[2
]}

Zhu, Jinsong ^{[1
]}

机构：

[1] Nanjing Univ, Dept Phys, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China

[2] Tech Univ Dresden, Inst Angew Photophys, D-01062 Dresden, Germany

[3] Southeast Univ, Dept Phys, Nanjing 211189, Peoples R China

来源：

PHYSICS LETTERS A | 2009年 / 374卷 / 02期

基金：

美国国家科学基金会;

关键词：

Thin film ferroelectrics; Stress impact; Scanning probe microscope; Dynamic domain change; DIELECTRIC-PROPERTIES; UNIAXIAL-STRESS; THIN-FILMS; DOMAIN; BEHAVIOR; PHYSICS; STRAIN; POINT;

D O I：

10.1016/j.physleta.2009.10.084

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

A wafer bending stage and a scanning probe microscope are combined to investigate the in situ domain pattern evolution in polycrystalline Bi3.25La0.75Ti3O12 films under stress. We observe the stress induced polarization reorientation that sensitively depends on the relative alignment of the BLT unit cell with respect to the stress. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：360 / 365

页数：6

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