Oxidation behavior of silicon nitride sintered with Lu2O3 additive

被引:5
作者
Jordache, Madeleine K. [1 ]
Du, Henry [1 ]
机构
[1] Stevens Inst Technol, Dept Chem Biomed & Mat Engn, Hoboken, NJ 07030 USA
关键词
HOT-PRESSED SI3N4; CERAMICS; STRENGTH; 1500-DEGREES-C; KINETICS;
D O I
10.1007/s10853-006-0949-z
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Kyocera SN282 silicon nitride ceramics sintered with 5.35 wt% Lu2O3 were oxidized in dry oxygen at 930-1,200 degrees C. Oxidation of SN282 follows a parabolic rate law. SN282 exhibits significantly lower parabolic rate constants and better oxide morphological stability than silicon nitride containing other sintering additives under similar conditions. The activation energy for oxidation of SN282 is 107 +/- 5 kJ/mol K, suggesting inward diffusion of molecular oxygen in the oxide layer as the rate-limiting mechanism.
引用
收藏
页码:7040 / 7044
页数:5
相关论文
共 17 条
[1]  
Babini G.N., 1981, SCI CERAMICS, V11, P291
[2]   High temperature strength and oxidation behaviour of hot-pressed silicon nitride disilicate ceramics [J].
Choi, HJ ;
Lee, JG ;
Kim, YW .
JOURNAL OF MATERIALS SCIENCE, 1997, 32 (07) :1937-1942
[3]   Oxidation behavior of hot-pressed Si3N4 with Re2O3 (Re = Y, Yb, Er, La) [J].
Choi, HJ ;
Lee, JG ;
Kim, YW .
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 1999, 19 (16) :2757-2762
[4]   STRENGTH AND CREEP-BEHAVIOR OF RARE-EARTH DISILICATE SILICON-NITRIDE CERAMICS [J].
CINIBULK, MK ;
THOMAS, G ;
JOHNSON, SM .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1992, 75 (08) :2050-2055
[5]   OXIDATION OF SI3N4 ALLOYS - RELATION TO PHASE-EQUILIBRIA IN THE SYSTEM SI3N4-SIO2-MGO [J].
CLARKE, DR ;
LANGE, FF .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1980, 63 (9-10) :586-593
[6]   KINETICS OF OXIDATION OF HOT-PRESSED SILICON-NITRIDE CONTAINING MAGNESIA [J].
CUBICCIOTTI, D ;
LAU, KH .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1978, 61 (11-1) :512-517
[7]   KINETICS OF OXIDATION OF YTTRIA HOT-PRESSED SILICON-NITRIDE [J].
CUBICCIOTTI, D ;
LAU, KH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (10) :1723-1728
[8]   GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON [J].
DEAL, BE ;
GROVE, AS .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) :3770-&
[9]   Paralinear oxidation of silicon nitride in a water-vapor/oxygen environment [J].
Fox, DS ;
Opila, EJ ;
Nguyen, QN ;
Humphrey, DL ;
Lewton, SM .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2003, 86 (08) :1256-1261
[10]   OXIDATION OF YTTRIA-CONTAINING AND ALUMINA-CONTAINING DENSE SILICON-NITRIDE CERAMICS [J].
GOGOTSI, YG ;
GRATHWOHL, G ;
THUMMLER, F ;
YAROSHENKO, VP ;
HERRMANN, M ;
TAUT, C .
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 1993, 11 (04) :375-386