Imaging thin films of nanoporous low-k dielectrics:: Comparison between ultramicrotomy and focused ion beam preparations for transmission electron microscopy

被引：11

作者：

Thompson, LE ^{[1
]}

Rice, PM ^{[1
]}

Delenia, E ^{[1
]}

Lee, VY ^{[1
]}

Brock, PJ ^{[1
]}

Magbitang, TP ^{[1
]}

Dubois, G ^{[1
]}

Volksen, W ^{[1
]}

Miller, RD ^{[1
]}

Kim, HC ^{[1
]}

机构：

[1] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

来源：

MICROSCOPY AND MICROANALYSIS | 2006年 / 12卷 / 02期

关键词：

FIB; low-k materials; nanoporous materials; ultramicrotomy; TEM;

D O I：

10.1017/S1431927606060041

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ultramicrotomy, the technique of cutting nanometers-thin slices of material using a diamond knife, was applied to prepare transmission electron microscope (TEM) specimens of nanoporous poly(methylsilses-quioxane) (PMSSQ) thin films. This technique was compared to focused ion beam (FIB) cross-section preparation to address possible artifacts resulting from deformation of nanoporous microstructure during the sample preparation. It was found that ultra microtomy is a successful TEM specimen preparation method for nanoporous PMSSQ thin films when combined with low-energy ion milling as a final step. A thick, sacrificial carbon coating was identified as a method Of reducing defects from the FIB process which included film shrinkage and pore deformation.

引用

页码：156 / 159

页数：4

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