The Role of R&D Offshoring in Explaining the Patent Growth of China and India at USPTO

被引：0

作者：

Duan, Yibing ^{[1
]}

Kong, Yan ^{[1
]}

机构：

[1] Chinese Acad Sci, Inst Policy & Management, Beijing 100190, Peoples R China

来源：

2008 IEEE INTERNATIONAL CONFERENCE ON MANAGEMENT OF INNOVATION AND TECHNOLOGY, VOLS 1-3 | 2008年

关键词：

Patent; R&D offshoring; China; India;

D O I：

10.1109/ICMIT.2008.4654463

中图分类号：

C93 [管理学];

学科分类号：

12 ; 1201 ; 1202 ; 120202 ;

摘要：

Recently granted patents by Chinese and Indian inventors for protection at the US Patent and Trademark Office (USPTO) increase rapidly, although from a quite low base. This paper uses patent data to explore the phenomenon of Chinese and India inventors' growing interest to apply for USPTO patents. We draw on a comprehensive database consisting of all granted utility patents with China or India as residence of the first-named inventors from 1988 to 2007. Data show both in China and India, most USPTO patents are owned by foreign assignees. The results coincide with the trends of FDI and related foreign-invested R&D activities in two countries by time, area and industry. We discuss the policy implications of R&D offshoring finally.

引用

页码：772 / 776

页数：5

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