Thermal annealing study of 1 MeV electron-irradiation-induced defects in n+p InGaP diodes and solar cells

被引:48
作者
Khan, A
Yamaguchi, M
Bourgoin, JC
Takamoto, T
机构
[1] Toyota Technol Inst, Tempa Ku, Nagoya, Aichi 4688511, Japan
[2] Univ Paris 06, Lab Milieux Desordonnes & Heterogenes, CNRS, UMR 7603, F-75252 Paris 05, France
[3] Japan Energy Corp, Cent Res Lab, Toda, Saitama 3358502, Japan
关键词
D O I
10.1063/1.1433936
中图分类号
O59 [应用物理学];
学科分类号
摘要
The study presents detailed isothermal and isochronal annealing recovery of photovoltaic parameters in n(+)/p InGaP solar cells after 1 MeV electron irradiation. Correlation of the solar cells characteristics with changes in the deep level transient spectroscopy data observed in irradiated and annealed n(+)/p InGaP diodes and solar cells shows that the H2 (E-v+0.50 eV) and H3 (E-v+0.76 eV) defects have a dominant role in governing the minority-carrier lifetime as well as carrier removal. However, capacitance-voltage measurements indicate that other defects must also play a role in the carrier removal process. In addition, the concentration of the H2 defect is found to decay significantly as a result of room temperature storage for 40 days, suggesting that InGaP-based solar cells will display superior radiation tolerance in space. Finally, the deep donor-like-defect H2 is tentatively identified as a phosphorus Frenkel pair. (C) 2002 American Institute of Physics.
引用
收藏
页码:2391 / 2397
页数:7
相关论文
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