Combinatorial Synthesis Study of Passivation Layers for Solar Cell Applications

被引:4
作者
Ikeno, N. [1 ,2 ,4 ]
Tachibana, T. [1 ,4 ]
Lee, H. [1 ,4 ]
Yoshida, H. [3 ,4 ]
Arafune, K. [3 ,4 ]
Satoh, S. [3 ,4 ]
Chikyow, T. [2 ]
Ogura, A. [1 ,4 ]
机构
[1] Meiji Univ, Tama Ku, 1-1-1 Higashimita, Kawasaki, Kanagawa 2148571, Japan
[2] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050044, Japan
[3] Univ Hyogo, Himeji, Hyogo 6712280, Japan
[4] JST, CREST, Kawaguchi, Saitama 3320012, Japan
来源
DEFECTS-RECOGNITION, IMAGING AND PHYSICS IN SEMICONDUCTORS XIV | 2012年 / 725卷
基金
日本科学技术振兴机构;
关键词
Combinatorial synthesis; Surface passivation; Fixed charge; Photovoltaic; FILMS;
D O I
10.4028/www.scientific.net/MSF.725.161
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We investigated the new materials applicable for the field effect passivation layer in crystalline Si solar cells, ZrO2-Al2O3 and ZrO2-Y2O3 binary systems, by using combinatorial synthesis method. As-deposited samples indicated hysteresis curves and flat band-voltage (V-FB) shifts at capacitance-voltage (C-V) measurements. After oxygen gas annealing (OGA) at 700 degrees C for 5min, an improvement of the hysteresis and a positive shift of V-FB were observed. OGA process influenced defects density related to decreasing oxygen vacancy. OGA processed ZrO2 incorporated with 20% Al2O3 and 15% Y2O3 structures showed the maximized negative fixed charge of-5.8 X 10(12) cm(-2) and -7.8 X 10(12) cm(-2) in each system, respectively, suggesting that the ZrO2 based alloy systems were revealed to be the promising material for the passivation in the solar cell application.
引用
收藏
页码:161 / +
页数:2
相关论文
共 14 条
[1]   Correlation between microstructure and degradation in conductivity for cubic Y2O3-doped ZrO2 [J].
Butz, B. ;
Kruse, P. ;
Stoermer, H. ;
Gerthsen, D. ;
Mueller, A. ;
Weber, A. ;
Ivers-Tiffee, E. .
SOLID STATE IONICS, 2006, 177 (37-38) :3275-3284
[2]   Impact of diffusionless anneal using dynamic surface anneal on the electrical properties of a high-k/metal gate stack in metal-oxide-semiconductor devices [J].
Choi, Changhwan ;
Lee, Kam-Leung ;
Narayanan, Vijay .
APPLIED PHYSICS LETTERS, 2011, 98 (12)
[3]   Hysteresis in metal insulator semiconductor structures with high temperature annealed ZrO2/SiOx layers [J].
Gueorguiev, Valentin K. ;
Aleksandrova, Petya V. ;
Ivanov, Tzvetan E. ;
Koprinarova, Jordanka B. .
THIN SOLID FILMS, 2009, 517 (05) :1815-1820
[4]   Amorphous stability of HfO2 based ternary and binary composition spread oxide films as alternative gate dielectrics [J].
Hasegawa, K ;
Ahmet, P ;
Okazaki, N ;
Hasegawa, T ;
Fujimoto, K ;
Watanabe, M ;
Chikyow, T ;
Koinuma, H .
APPLIED SURFACE SCIENCE, 2004, 223 (1-3) :229-232
[5]   Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3 [J].
Hoex, B. ;
Heil, S. B. S. ;
Langereis, E. ;
van de Sanden, M. C. M. ;
Kessels, W. M. M. .
APPLIED PHYSICS LETTERS, 2006, 89 (04)
[6]   On the c-Si surface passivation mechanism by the negative-charge-dielectric Al2O3 [J].
Hoex, B. ;
Gielis, J. J. H. ;
de Sanden, M. C. M. van ;
Kessels, W. M. M. .
JOURNAL OF APPLIED PHYSICS, 2008, 104 (11)
[7]   Structural and electrical properties of yttria-stabilized zirconia films with controlled Y content heteroepitaxially grown on Si by reactive sputtering [J].
Horita, S ;
Watanabe, M ;
Masuda, A .
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1998, 54 (1-2) :79-83
[8]   Effective surface passivation of crystalline silicon by rf sputtered aluminum oxide [J].
Li, Tsu-Tsung ;
Cuevas, Andres .
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2009, 3 (05) :160-162
[9]   High Quality Aluminum Oxide Passivation Layer for Crystalline Silicon Solar Cells Deposited by Parallel-Plate Plasma-Enhanced Chemical Vapor Deposition [J].
Miyajima, Shinsuke ;
Irikawa, Junpei ;
Yamada, Akira ;
Konagai, Makoto .
APPLIED PHYSICS EXPRESS, 2010, 3 (01)
[10]  
Nicollian E.H., 2003, MOS Physics and Technology