An Extremely Simple and Effective Strategy to Tailor the Surface Performance of Inorganic Substrates by Two New Photochemical Reactions

被引：18

作者：

Cao, Xiliang ^{[1
]}

Zhang, Tong ^{[2
]}

Deng, Jianyuan ^{[1
]}

Jiang, Lei ^{[2
]}

Yang, Wantai ^{[1
]}

机构：

[1] Beijing Univ Chem Technol, Coll Mat Sci & Engn, State Key Lab Chem Resource Engn, Beijing 100029, Peoples R China

[2] Chinese Acad Sci, Inst Chem, Beijing 100190, Peoples R China

来源：

ACS APPLIED MATERIALS & INTERFACES | 2013年 / 5卷 / 03期

基金：

中国国家自然科学基金;

关键词：

SAMs; patterned surface; photochemical reaction; DMF; APS; UV; OXIDATION; MONOLAYERS; FUNCTIONALIZATION; ADSORPTION; MECHANISM;

D O I：

10.1021/am302582x

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

This article reports on a new sequential strategy to fabricate monolayer functional organosilane films on inorganic substrate surfaces, and subsequently, to pattern them by two new photochemical reactions. (1) By using UV light (254 nm) plus dimethylformamide (DMF), a functional silane monolayer film could be fabricated quickly (within minutes) under ambient temperature. (2) The organic groups of the formed films became decomposed in a few minutes with UV irradiation coupled with a water solution of ammonium persulfate (APS). (3) When two photochemical reactions were sequentially combined, a high-quality patterned functional surface could be obtained thanks to the photomask.

引用

页码：494 / 499

页数：6

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