Femtosecond laser-induced electronic plasma at metal surface

被引：30

作者：

Chen, Zhaoyang ^{[1
]}

Mao, Samuel S. ^{[1
]}

机构：

[1] Univ Calif Berkeley, Dept Mech Engn, Berkeley, CA 94720 USA

来源：

APPLIED PHYSICS LETTERS | 2008年 / 93卷 / 05期

关键词：

D O I：

10.1063/1.2966152

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We develop a theoretical analysis to model plasma initiation at the early stage of femtosecond laser irradiation of metal surfaces. The calculation reveals that there is a threshold intensity for the formation of a microscale electronic plasma at the laser-irradidated metal surface. As the full width at half maximum of a laser pulse increases from 15 to 200 fs, the plasma formation threshold decreases by merely about 20%. The dependence of the threshold intensity on laser pulse width can be attributed to laser-induced surface electron emission, in particular due to the effect of photoelectric effect. (c) 2008 American Institute of Physics.

引用

页数：3

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