Effects of oxygen addition on enhancing electrochromic performance of flexible tungsten/tantalum oxide films using an atmospheric pressure plasma jet

被引：6

作者：

Lin, Yung-Sen ^{[1
]}

Chen, Yen-Cheng ^{[1
]}

Tien, Shih-Wei ^{[1
]}

机构：

[1] Feng Chia Univ, Dept Chem Engn, Taichung 40724, Taiwan

来源：

SURFACE & COATINGS TECHNOLOGY | 2013年 / 221卷

关键词：

PECVD; Electrochromic materials; Tungsten oxide; Tantalum oxide; Atmospheric pressure plasma; TA2O5; THIN-FILMS; WO3; DEPOSITION; DEVICES;

D O I：

10.1016/j.surfcoat.2013.02.001

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

An investigation was conducted on the lithium electrochromic performance of flexible organo-tungsten-tantalum oxide (WTaxOyCz) films enhanced by the addition of oxygen gases into an atmospheric pressure plasma jet at various flow rates for a short exposure duration of 33 s. The deposition of flexible WTaxOyCz films onto flexible 40 Omega/square polyethylene terephthalate/indium tin oxide substrates using a certain addition of oxygen gas into plasma jet offers notable electrochromic performance after 200 cycles of reversible Li+ ion intercalation and de-intercalation in a 1 M LiClO4-propylene carbonate electrolyte tested by potential sweep switching between -1 V and 1 V at a scan rate of 50 mV/s and the potential step switching at -1 V for 20 s and 1 V for 13 s. The optical modulation (Delta T) of amorphous WTaxOyCz at a wavelength of 803.4 nm was significantly improved from 29.8% without the addition of oxygen gas to 61.2% with the addition of oxygen gas at a flow rate of 0.75 sccm into a plasma jet. (C) 2013 Elsevier B.V. All rights reserved.

引用

页码：173 / 181

页数：9

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