Relaxation study of AlGaAs cladding layers in InGaAs/GaAs (111)B lasers designed for 1.0-1.1 μm operation

被引:2
作者
Gutiérrez, M
Herrera, M
González, D
Aragón, G
Sánchez, JJ
Izpura, I
Hopkinson, M
García, R
机构
[1] Univ Cadiz, Dept Ciencia Mat & Ingn Met & Quim Inorgan, Cadiz 11510, Spain
[2] Univ Politecn Madrid, ETSI Telecommun, Dept Ingn Elect, Madrid 28040, Spain
[3] Univ Sheffield, Dept Elect & Elect Engn, Sheffield S1 3JD, S Yorkshire, England
关键词
laser; critical layer thickness; dislocation multiplication; AlGaAs (111); transmission electron microscopy; InGaAs; MBE;
D O I
10.1016/S0026-2692(02)00018-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
InGaAs/GaAs-based lasers require thick AlGaAs cladding layers to provide optical confinement. Although the lattice mismatch between GaAs and AlGaAs is very low, relaxation may occur due to the thickness requirement for an AlGaAs waveguide of the order of microns. We have studied the relaxation of InGaAs/GaAs lasers with AlGaAs waveguides grown on GaAs (111)B substrates. We have observed by transmission electron microscopy (TEM) that certain AlGaAs layers show a high density of threading dislocations (TDs), whilst other AlGaAs layers remain essentially dislocation free. To explain the experimental results a model based on dislocation multiplication has been developed. TDs in the AlGaAs cladding layers are observed when the critical layer thickness (CLT) for dislocation multiplication has been overcome. Consequently, a design rule based on a modified CLT model for AlGaAs/GaAs (111)B is proposed. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:553 / 557
页数:5
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