Field emission from reconstructed heavily phosphorus-doped homoepitaxial diamond (111)

被引:31
作者
Yamada, T
Okano, K
Yamaguchi, H
Kato, H
Shikata, S
Nebel, CE
机构
[1] Natl Inst Adv Ind Sci & Technol, Diamond Res Ctr, Tsukuba, Ibaraki 3058568, Japan
[2] Int Christian Univ, Dept Phys, Mitaka, Tokyo 1818585, Japan
关键词
D O I
10.1063/1.2206552
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report about field emission from reconstructed phosphorus-doped diamond surfaces. In order to reconstruct the surface, annealing at 950 degrees C for 60 min in a high vacuum system has been applied. Field emission shows the lowest threshold field for the reconstructed surface of 16 V/mu m, while the threshold fields for oxidized and hydrogen-terminated surface are 28 and 44 V/mu m, respectively. A model is introduced to discuss these results, which takes into account effective electron affinities and tunneling of electrons from conduction band and donor levels. (c) 2006 American Institute of Physics.
引用
收藏
页数:3
相关论文
共 16 条
[1]   Electron emission in intense electric fields [J].
Fowler, RH ;
Nordheim, L .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-CONTAINING PAPERS OF A MATHEMATICAL AND PHYSICAL CHARACTER, 1928, 119 (781) :173-181
[2]   Growth and characterization of phosphorous doped {111} homoepitaxial diamond thin films [J].
Koizumi, S ;
Kamo, M ;
Sato, Y ;
Ozaki, H ;
Inuzuka, T .
APPLIED PHYSICS LETTERS, 1997, 71 (08) :1065-1067
[3]   Electron affinity of plasma-hydrogenated and chemically oxidized diamond (100) surfaces [J].
Maier, F ;
Ristein, J ;
Ley, L .
PHYSICAL REVIEW B, 2001, 64 (16)
[4]  
Modinos A., 1984, Field, Thermionic, and Secondary Electron Emission Spectroscopy
[5]  
NEBEL CE, 2004, THIN FILM DIAMOND, pCH2
[6]   ELECTRON-EMISSION FROM PHOSPHORUS-DOPED AND BORON-DOPED POLYCRYSTALLINE DIAMOND FILMS [J].
OKANO, K ;
GLEASON, KK .
ELECTRONICS LETTERS, 1995, 31 (01) :74-75
[7]   PHYSICAL-PROPERTIES OF THIN-FILM FIELD-EMISSION CATHODES WITH MOLYBDENUM CONES [J].
SPINDT, CA ;
BRODIE, I ;
HUMPHREY, L ;
WESTERBERG, ER .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (12) :5248-5263
[8]  
Sugino T, 1999, PHYS STATUS SOLIDI A, V174, P145, DOI 10.1002/(SICI)1521-396X(199907)174:1<145::AID-PSSA145>3.0.CO
[9]  
2-T
[10]  
Sze S.M., 2013, SEMICONDUCTOR DEVICE