Nanoscale and Single-Dot Patterning of Colloidal Quantum Dots

被引：56

作者：

Xie, Weiqiang ^{[1
,2
]}

Gomes, Raquel ^{[2
,3
]}

Aubert, Tangi ^{[2
,3
]}

Bisschop, Suzanne ^{[2
,3
]}

Zhu, Yunpeng ^{[1
,2
]}

Hens, Zeger ^{[2
,3
]}

Brainis, Edouard ^{[2
,3
]}

Van Thourhout, Dries ^{[1
,2
]}

机构：

[1] Univ Ghent, INTEC Dept, Sint Pietersnieuwstr 41, B-9000 Ghent, Belgium

[2] Univ Ghent, Ctr Nano & Biophoton NB Photon, B-9000 Ghent, Belgium

[3] Univ Ghent, Phys & Chem Nanostruct, B-9000 Ghent, Belgium

来源：

NANO LETTERS | 2015年 / 15卷 / 11期

基金：

欧盟地平线“2020”;

关键词：

Colloidal quantum dots; nanoscale patterning; single-dot positioning; Langmuir-Blodgett; lift-off; SEMICONDUCTOR NANOCRYSTALS; FILMS; FLUORESCENCE; EMISSION; BLINKING; NANOPARTICLES; ABSORPTION; SI;

D O I：

10.1021/acs.nanolett.5b03068

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Using an optimized lift-off process we develop a technique for both nanoscale and single-dot patterning of colloidal quantum dot films, demonstrating feature sizes down to similar to 30 nm for uniform films and a yield of 40% for single-dot positioning, which is in good agreement with a newly developed theoretical model. While first of all presenting a unique tool for studying physics of single quantum dots, the process also provides a pathway toward practical quantum dot-based optoelectronic devices.

引用

收藏

页码：7481 / 7487

页数：7

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