Critical thickness and orbital ordering in ultrathin La0.7Sr0.3MnO3 films
被引:379
作者:
Huijben, M.
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Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA
Univ Twente, Fac Sci & Technol, NL-7500 AE Enschede, Netherlands
Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, NetherlandsUniv Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Huijben, M.
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Martin, L. W.
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Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USAUniv Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Martin, L. W.
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Chu, Y. -H.
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Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA
Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 30010, TaiwanUniv Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Chu, Y. -H.
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Holcomb, M. B.
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Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USAUniv Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Holcomb, M. B.
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Yu, P.
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Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USAUniv Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Yu, P.
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Rijnders, G.
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Univ Twente, Fac Sci & Technol, NL-7500 AE Enschede, Netherlands
Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, NetherlandsUniv Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Rijnders, G.
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]
Blank, D. H. A.
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Univ Twente, Fac Sci & Technol, NL-7500 AE Enschede, Netherlands
Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, NetherlandsUniv Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Blank, D. H. A.
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Ramesh, R.
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Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USAUniv Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
Ramesh, R.
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机构:
[1] Univ Calif Berkeley, Dept Mat Sci & Engn, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Dept Phys, Berkeley, CA 94720 USA
[3] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA
Detailed analysis of transport, magnetism, and x-ray absorption spectroscopy measurements on ultrathin La0.7Sr0.3MnO3 films with thicknesses from 3 to 70 unit cells resulted in the identification of a lower critical thickness for a nonmetallic nonferromagnetic layer at the interface with the SrTiO3 (001) substrate of only three unit cells (similar to 12 angstrom). Furthermore, linear-dichroism measurements demonstrate the presence of a preferred (x(2)-y(2)) in-plane orbital ordering for all layer thicknesses without any orbital reconstruction at the interface. A crucial requirement for the accurate study of these ultrathin films is a controlled growth process, offering the coexistence of layer-by-layer growth and bulklike magnetic/transport properties.