In-situ observation of self-cleansing phenomena during ultra-high vacuum anneal of transition metal nitride thin films: Prospects for non-destructive photoelectron spectroscopy

被引：32

作者：

Greczynski, G. ^{[1
]}

Hultman, L. ^{[1
]}

机构：

[1] Linkoping Univ, Dept Phys IFM, Thin Film Phys Div, SE-58183 Linkoping, Sweden

来源：

APPLIED PHYSICS LETTERS | 2016年 / 109卷 / 21期

关键词：

TITANIUM NITRIDE; DIFFUSION-BARRIERS; VANADIUM NITRIDE; TIN; OXIDATION; SPECTRA; GROWTH; TIALN; XPS;

D O I：

10.1063/1.4968803

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Self-cleansing of transition metal nitrides is discovered to take place during ultra-high vacuum annealing of TiN, NbN, and VN thin films. Native oxide layers from air exposure disappear after isothermal anneal at 1000 degrees C. Also, for TiN, the Ti 2p and N 1s X-ray photoelectron spectra (XPS) recorded after the anneal are identical to those obtained from in-situ grown and analyzed epitaxial TiN(001). These unexpected effects are explained by oxide decomposition in combination with N-replenishing of the nitride during recrystallization. The finding opens up new possibilities for true bonding assignments through non-destructive XPS analyses, thus avoiding artefacts from Ar etching. (C) 2016 Author(s).

引用

页数：5

共 41 条

[1] Screening effects in the Ti 2p core level spectra of Ti-based ternary nitrides [J].

Arranz, A. ;

Palacio, C. .

SURFACE SCIENCE, 2006, 600 (12) :2510-2517

[2] NATURE OF THE USE OF ADVENTITIOUS CARBON AS A BINDING-ENERGY STANDARD [J].

BARR, TL ;

SEAL, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (03) :1239-1246

[3] SURFACE CHEMICAL-CHANGES IN PVD TIN LAYERS INDUCED BY ION-BOMBARDMENT [J].

BERTOTI, I ;

MOHAI, M ;

SULLIVAN, JL ;

SAIED, SO .

SURFACE AND INTERFACE ANALYSIS, 1994, 21 (6-7) :467-473

[4]

Birkholz M, 2006, THIN FILM ANALYSIS BY X-RAY SCATTERING, P1

[5] Dense fully 111-textured TiN diffusion barriers: Enhanced lifetime through microstructure control during layer growth [J].

Chun, JS ;

Petrov, I ;

Greene, JE .

JOURNAL OF APPLIED PHYSICS, 1999, 86 (07) :3633-3641

[6] Comparison of surface oxidation of titanium nitride and chromium nitride films studied by x-ray absorption and photoelectron spectroscopy [J].

Esaka, F ;

Furuya, K ;

Shimada, H ;

Imamura, M ;

Matsubayashi, N ;

Sato, H ;

Nishijima, A ;

Kawana, A ;

Ichimura, H ;

Kikuchi, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (05) :2521-2528

[7] Oxidation of vanadium nitride and titanium nitride coatings [J].

Glaser, A. ;

Surnev, S. ;

Netzer, F. P. ;

Fateh, N. ;

Fontalvo, G. A. ;

Mitterer, C. .

SURFACE SCIENCE, 2007, 601 (04) :1153-1159

[8] Self-consistent modelling of X-ray photoelectron spectra from air-exposed polycrystalline TiN thin films [J].

Greczynski, G. ;

Hultman, L. .

APPLIED SURFACE SCIENCE, 2016, 387 :294-300

[9] Unintentional carbide formation evidenced during high-vacuum magnetron sputtering of transition metal nitride thin films [J].

Greczynski, G. ;

Mraz, S. ;

Hultman, L. ;

Schneider, J. M. .

APPLIED SURFACE SCIENCE, 2016, 385 :356-359

[10] Venting temperature determines surface chemistry of magnetron sputtered TiN films [J].

Greczynski, G. ;

Mraz, S. ;

Hultman, L. ;

Schneider, J. M. .

APPLIED PHYSICS LETTERS, 2016, 108 (04)

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