Effects of atmospheric pressure plasma surface treatments on the patternability and electrical property of screen-printed Ag nanopaste
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作者:
Lee, Young-Chul
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Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea
Lee, Young-Chul
[1
]
Kim, Jong-Woong
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Korea Elect Technol Inst, Display Components & Mat Res Ctr, Songnam 463816, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea
Kim, Jong-Woong
[2
]
Yoon, Jeong-Won
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Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea
Yoon, Jeong-Won
[3
]
Yang, Cheol-Woong
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Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea
Yang, Cheol-Woong
[1
]
Kim, Yongil
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Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea
Kim, Yongil
[1
]
Jung, Seung-Boo
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Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South KoreaSungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea
Jung, Seung-Boo
[1
]
机构:
[1] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea
[2] Korea Elect Technol Inst, Display Components & Mat Res Ctr, Songnam 463816, South Korea
[3] Samsung Adv Inst Technol, Yongin 446712, Gyeonggi Do, South Korea
We examined the effect of surface treatment using atmospheric pressure plasma on the patternability of screen-printed Ag nanopaste in an attempt to fabricate the ideal patterned shape. We also evaluated the electrical property of conductive circuit according to the kinds and degree of treatments. In hydrophobic treatment, the contact angle was up to 108.94A degrees. In hydrophilic treatment, the contact angle was around 20. The hydrophobic and hydrophilic treatments affected the characteristics of the printed Ag pattern. With the hydrophobic treatment, the thickness of the patterns increased as the treatment time increased but decreased with the hydrophilic treatment. For the electrical property, excessive surface treatment of either treatment increased the insertion losses as compared with a sputtered pattern on a non-treated surface. We confirmed that electrical property and patternability in direct printed conductive circuits could be improved by properly controlled APP treatment.
机构:
Chungbuk Natl Univ, Dept Adv Mat Engn, Cheongju 361763, South Korea
Chungbuk Natl Univ, Ctr Res Instruments & Expt Facil, Cheongju 361763, South KoreaChungbuk Natl Univ, Dept Adv Mat Engn, Cheongju 361763, South Korea
Chae, Hong-Chol
Hong, Joo-Wha
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Chungbuk Natl Univ, Dept Adv Mat Engn, Cheongju 361763, South KoreaChungbuk Natl Univ, Dept Adv Mat Engn, Cheongju 361763, South Korea
Hong, Joo-Wha
[J].
KOREAN JOURNAL OF METALS AND MATERIALS,
2012,
50
(07):
: 545
-
548
机构:
Univ Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, BelgiumUniv Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, Belgium
Jacobs, Tinneke
Morent, Rino
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Univ Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, BelgiumUniv Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, Belgium
Morent, Rino
De Geyter, Nathalie
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机构:
Univ Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, BelgiumUniv Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, Belgium
De Geyter, Nathalie
Leys, Christophe
论文数: 0引用数: 0
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机构:
Univ Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, BelgiumUniv Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, Belgium
机构:
Chungbuk Natl Univ, Dept Adv Mat Engn, Cheongju 361763, South Korea
Chungbuk Natl Univ, Ctr Res Instruments & Expt Facil, Cheongju 361763, South KoreaChungbuk Natl Univ, Dept Adv Mat Engn, Cheongju 361763, South Korea
Chae, Hong-Chol
Hong, Joo-Wha
论文数: 0引用数: 0
h-index: 0
机构:
Chungbuk Natl Univ, Dept Adv Mat Engn, Cheongju 361763, South KoreaChungbuk Natl Univ, Dept Adv Mat Engn, Cheongju 361763, South Korea
Hong, Joo-Wha
[J].
KOREAN JOURNAL OF METALS AND MATERIALS,
2012,
50
(07):
: 545
-
548
机构:
Univ Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, BelgiumUniv Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, Belgium
Jacobs, Tinneke
Morent, Rino
论文数: 0引用数: 0
h-index: 0
机构:
Univ Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, BelgiumUniv Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, Belgium
Morent, Rino
De Geyter, Nathalie
论文数: 0引用数: 0
h-index: 0
机构:
Univ Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, BelgiumUniv Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, Belgium
De Geyter, Nathalie
Leys, Christophe
论文数: 0引用数: 0
h-index: 0
机构:
Univ Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, BelgiumUniv Ghent, Dept Appl Phys, Res Unit Plasma Technol, Fac Engn, B-9000 Ghent, Belgium