Surface stress control using ultraviolet light irradiation of plasma-polymerized thin films

被引：9
作者：
Igarashi, S
Itakura, AN
Kitajima, M
Chifen, AN
Förch, R
Berger, R
机构：
[1] Max Planck Inst Polymer Res, D-55128 Mainz, Germany
[2] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
[3] Japan Sci & Technol Agcy, Kawaguchi 3320012, Japan
[4] Univ Tsukuba, Tsukuba, Ibaraki 3058571, Japan
来源：
APPLIED PHYSICS LETTERS | 2006年 / 88卷 / 14期
基金：
日本科学技术振兴机构;
关键词：
Thin films;
D O I：
10.1063/1.2183807
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We investigated the surface stress change of plasma-polymerized allylamine films on 2 mu m thick silicon micromechanical cantilever substrates induced by ultraviolet light (UV) irradiation. Compressive surface stress was generated during the UV irradiation of the plasma-polymerized films in a dry environment, whereas tensile stress was measured in a humid environment. Fourier transform infrared spectroscopic analysis indicated two mechanisms taking place depending on the environmental conditions. These were attributed to crosslinking and oxidation reactions of the plasma polymer. UV irradiation of plasma polymerized allylamine films at defined humidity suggests a feasible method for achieving tensile and compressive surface stress patterning.
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页数：3
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