High-Power Copper Gratings for a Sheet-Beam Traveling-Wave Amplifier at G-band

被引：37
|
作者：
Joye, Colin D. [1 ]
Calame, Jeffrey P. [1 ]
Cook, Alan M. [1 ]
Garven, Morag [2 ]
机构：
[1] USN, Res Lab, Washington, DC 20375 USA
[2] Sci Applicat Int Corp, Mclean, VA 22102 USA
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 2013年 / 60卷 / 01期
关键词：
Copper grating; millimeter-wave (mmW) amplifiers; photolithography; slow-wave structures;
D O I：
10.1109/TED.2012.2226591
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The design, fabrication, and electromagnetic cold testing results of an all-copper grating circuit intended for a G-band sheet-beam traveling-wave amplifier are presented. Fabrication was carried out via ultraviolet photolithography (UV-LIGA) using the SU-8 photoresists. Two cold test methods used to characterize the microfabricated circuits are reported and reveal excellent agreement with simulations. This type of all-copper grating also shows potential for use as a high-average-power sharp-cutoff filter.
引用
收藏
页码：506 / 509
页数：4
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