High-Power Copper Gratings for a Sheet-Beam Traveling-Wave Amplifier at G-band

被引：37

作者：

Joye, Colin D. ^{[1
]}

Calame, Jeffrey P. ^{[1
]}

Cook, Alan M. ^{[1
]}

Garven, Morag ^{[2
]}

机构：

[1] USN, Res Lab, Washington, DC 20375 USA

[2] Sci Applicat Int Corp, Mclean, VA 22102 USA

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 2013年 / 60卷 / 01期

关键词：

Copper grating; millimeter-wave (mmW) amplifiers; photolithography; slow-wave structures;

D O I：

10.1109/TED.2012.2226591

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The design, fabrication, and electromagnetic cold testing results of an all-copper grating circuit intended for a G-band sheet-beam traveling-wave amplifier are presented. Fabrication was carried out via ultraviolet photolithography (UV-LIGA) using the SU-8 photoresists. Two cold test methods used to characterize the microfabricated circuits are reported and reveal excellent agreement with simulations. This type of all-copper grating also shows potential for use as a high-average-power sharp-cutoff filter.

引用

收藏

页码：506 / 509

页数：4

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