Main-chain photosensitive polyamic acids using alkaline aqueous solution as developer

被引：1
|
作者：
Hou, HQ [1 ]
Yang, ZH [1 ]
Ding, MX [1 ]
机构：
[1] Acad Sinica, Changchun Inst Appl Chem, Changchun 130022, Peoples R China
来源：
POLYMER INTERNATIONAL | 1999年 / 48卷 / 05期
关键词：
photosensitive polyimide; alkaline aqueous solution; development;
D O I：
10.1002/(SICI)1097-0126(199905)48:5<421::AID-PI153>3.0.CO;2-5
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
In order to develop photosensitive polyimides (PSPIs) imaged in alkaline aqueous solution, a photosensitive diamine and relevant polymer containing conjugated double bonds in the main chain have been synthesized. The photosensitive characteristics and thermal stability of the polymers were investigated. These polymers possess good thermal stability and sensitivity to UV irradiation, and could be used to form a PSPI resist using alkaline aqueous solution as developer. (C) 1999 Society of Chemical Industry.
引用
收藏
页码：421 / 425
页数：5
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