Pulse-reverse electrodeposition of Cu-SiC nanocomposite coating: Effect of concentration of SiC in the electrolyte

被引:42
作者
Pradhan, Ajaya Kumar [1 ]
Das, Siddhartha [1 ]
机构
[1] Indian Inst Technol, Dept Met & Mat Engn, Kharagpur 721302, W Bengal, India
关键词
Cu-SiC; Nanocomposite; Pulse reverse; Electrodeposition; COMPOSITE COATINGS; MICRO; NANO; MATRIX; NICKEL; MICROSTRUCTURE; DEPOSITION; PARTICLES; CODEPOSITION; NANOPARTICLES;
D O I
10.1016/j.jallcom.2013.12.139
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Cu-SiC nanocomposite coatings have been electrodeposited from an aqueous sulfate electrolyte using pulse reverse current. The effect of different concentrations of nano SiC particles in the electrolyte on codeposition and hence on the properties of the composites have been studied both in absence and in the presence of three different types of surfactant (anionic, cationic and nonionic). The amount of incorporated reinforcement in the composite has been observed to be dependent on the presence and the nature of the surfactants. Cationic surfactant has been observed to be the most capable surfactant in incorporating SiC particles into the copper matrix. Composites prepared under highest concentration of SiC particle in the electrolyte have been observed to be under highest tensile stress. The hardness has been observed to be dependent on the combined effect of incorporated reinforcement, structure and crystallite size of the composites. In the presence of surfactants, most attractive hardness values have been observed in the composites prepared from a solution containing 5 g/L nano SiC particles. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:294 / 302
页数:9
相关论文
共 35 条
[1]  
Atay F, 2007, J OPTOELECTRON ADV M, V9, P3604
[2]   A review on fundamentals and applications of electrophoretic deposition (EPD) [J].
Besra, Laxmidhar ;
Liu, Meilin .
PROGRESS IN MATERIALS SCIENCE, 2007, 52 (01) :1-61
[3]   A MATHEMATICAL-MODEL FOR THE ELECTROLYTIC CODEPOSITION OF PARTICLES WITH A METALLIC MATRIX [J].
CELIS, JP ;
ROOS, JR ;
BUELENS, C .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (06) :1402-1408
[4]   Effect of reverse pulse current on the internal stress of electroformed nickel [J].
Chan, KC ;
Qu, NS ;
Zhu, D .
JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 1997, 63 (1-3) :819-822
[5]   Pulse and pulse reverse plating - Conceptual, advantages and applications [J].
Chandrasekar, M. S. ;
Pushpavanam, Malathy .
ELECTROCHIMICA ACTA, 2008, 53 (08) :3313-3322
[6]   Microstructure and properties of Ni-Co/nano-Al2O3 composite coatings by pulse reversal current electrodeposition [J].
Chang, L. M. ;
An, M. Z. ;
Guo, H. F. ;
Shi, S. Y. .
APPLIED SURFACE SCIENCE, 2006, 253 (04) :2132-2137
[7]   Hardness and wear resistance of Ni/Al2O3 composite coatings by electrodeposition [J].
Chang, Limin ;
Liu, Jianhua ;
Zhang, Ruijun .
MATERIALS PROCESSING TECHNOLOGIES, PTS 1 AND 2, 2011, 154-155 :654-+
[8]   Tailoring and patterning the grain size of nanocrystalline alloys [J].
Detor, Andrew J. ;
Schuh, Christopher A. .
ACTA MATERIALIA, 2007, 55 (01) :371-379
[9]   Pulsed-reverse current electrodeposition of Zn and Zn-TiO2 nanocomposite films [J].
Frade, T. ;
Bouzon, V. ;
Gomes, A. ;
da Silva Pereira, M. I. .
SURFACE & COATINGS TECHNOLOGY, 2010, 204 (21-22) :3592-3598
[10]   Electrochemical deposition of nickel/SiC composites in the presence of surfactants [J].
Ger, MD .
MATERIALS CHEMISTRY AND PHYSICS, 2004, 87 (01) :67-74