The hole shrink problem: Theoretical studies of directed self-assembly in cylindrical confinement

被引:9
作者
Laachi, Nabil [1 ]
Delaney, Kris T. [1 ]
Kim, Bongkeun [1 ]
Hur, Su-Mi [1 ]
Bristol, Robert
Shykind, David
Weinheimer, Corey J.
Fredrickson, Glenn H. [1 ]
机构
[1] Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA
来源
ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES V | 2013年 / 8680卷
关键词
Self-Consistent Field Theory (SCFT); graphoepitaxy; directed self-assembly; hole shrink problem; VIA lithography; contact holes; BLOCK-COPOLYMER;
D O I
10.1117/12.2011198
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We use self-consistent field theory (SCFT) to study the self-assembly of cylinder-forming diblock copolymers confined in a cylindrical prepattern. This situation arises in contact holes -the hole shrink problem-where the goal is to produce a cylindrical hole with reduced dimensions relative to a guiding prepattern. In this study, we focus on systems with a critical dimension (CD) ranging from 50nm to 100nm and which consequently lead to the formation of a single cylinder in the middle of the hole. We found that different morphologies arise from the self-assembly process and are strongly governed by the prepattern dimensions, wetting conditions as well as the polymer molecular weight. We also considered blends of diblock copolymers and homopolymers and determined optimal blending configurations that not only favor the formation of the desired cylindrical morphology but also extend the processing window relative to the pure diblock case.
引用
收藏
页数:9
相关论文
共 13 条
[1]   Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns [J].
Bang, Joona ;
Jeong, Unyong ;
Ryu, Du Yeol ;
Russell, Thomas P. ;
Hawker, Craig J. .
ADVANCED MATERIALS, 2009, 21 (47) :4769-4792
[2]   Microdomain ordering in laterally confined block copolymer thin films [J].
Bosse, August W. ;
Garcia-Cervera, Carlos J. ;
Fredrickson, Glenn H. .
MACROMOLECULES, 2007, 40 (26) :9570-9581
[3]  
Fredrickson G. H., 2006, International Series of Monographs on Physics, V134
[4]   Directed block copolymer self-assembly for nanoelectronics fabrication [J].
Herr, Daniel J. C. .
JOURNAL OF MATERIALS RESEARCH, 2011, 26 (02) :122-139
[5]   SCFT Simulations of Thin Film Blends of Block Copolymer and Homopolymer Laterally Confined in a Square Well [J].
Hur, Su-Mi ;
Garcia-Cervera, Carlos J. ;
Kramer, Edward J. ;
Fredrickson, Glenn H. .
MACROMOLECULES, 2009, 42 (15) :5861-5872
[6]  
Laachi N., 2012, P SPIE
[7]  
Liu C.-C., 2012, P SPIE
[8]   Patterning with block copolymer thin films [J].
Segalman, RA .
MATERIALS SCIENCE & ENGINEERING R-REPORTS, 2005, 48 (06) :191-226
[9]  
Seino Y., 2012, P SPIE
[10]  
Takahashi H., 2012, P SPIE