Effect of dual-temperature-grown InGaN/GaN multiple quantum wells on luminescence characteristics

被引:15
作者
Wang, Xiaowei [1 ,2 ]
Liang, Feng [1 ]
Zhao, Degang [1 ,3 ]
Jiang, Desheng [1 ]
Liu, Zongshun [1 ]
Zhu, Jianjun [1 ,3 ]
Yang, Jing [1 ]
Wang, Wenjie [4 ]
机构
[1] Chinese Acad Sci, State Key Lab Integrated Optoelect, Inst Semicond, Beijing 100083, Peoples R China
[2] Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R China
[3] Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
[4] China Acad Engn Phys, Microsyst & Terahertz Res Ctr, Chengdu 610200, Sichuan, Peoples R China
基金
中国国家自然科学基金;
关键词
InGaN/GaN MQW; Localization states; Dual-temperature growth; LOCALIZATION STATES; OPTICAL-PROPERTIES; EMISSION; BAND; GAN;
D O I
10.1016/j.jallcom.2019.03.180
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Room-temperature electroluminescence spectra of InGaN/GaN multiple quantum well (MQW) structures grown on sapphire substrate by metalorganic chemical vapor deposition (MOCVD) were investigated. It is found that, in comparison with the same-temperature growth of MQW layers, GaN barrier layers grown at a temperature higher than the well layer growth of 790 degrees C are beneficial to improve the emission intensity of InGaN/GaN MQWs. The XRD and AFM measurements show a better interface quality and less non-radiative recombination centers (trench defects) exist in the dual-temperaturegrown InGaN MQWs between InGaN well and GaN barrier layers. In addition, increasing barriers growth temperature will induce less concentration of deeper localization states which may contribute to a blue shift of EL emission wavelength. (C) 2019 Elsevier B.V. All rights reserved.
引用
收藏
页码:197 / 202
页数:6
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