Controlling Orientation and Order in Block Copolymer Thin Films

被引：40

作者：

Kim, Seung Hyun ^{[2
]}

Misner, Matthew J. ^{[1
]}

Russell, Thomas P. ^{[1
]}

机构：

[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA

[2] Inha Univ, Div Nanosyst Engn, Inchon 402751, South Korea

来源：

ADVANCED MATERIALS | 2008年 / 20卷 / 24期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1002/adma.200701206

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

A study was conducted to demonstrate simple methods for controlling orientation and order in block copolymer films. Two methods were used to control the orientation of cylindrical microdomains in thin films. The first method involved the utilization of a neutral layer, generated by anchoring a random copolymer to the substrate that can balance the interactions of each block with the substrate, removing the preferential wetting. The second method involved the addition of hydroxyl-terminated homopolymers to the block copolymer solution that can rapidly interact with a silicon substrate, forming a thin layer between the block copolymer film and the substrate. The two methods were found to be effective in controlling the interfacial interactions, enabling an orientation of the cylindrical microdomains of the block copolymer.

引用

页码：4851 / +

页数：7

共 44 条

[1] Effects of confinement on material behaviour at the nanometre size scale [J].

Alcoutlabi, M ;

McKenna, GB .

JOURNAL OF PHYSICS-CONDENSED MATTER, 2005, 17 (15) :R461-R524

[2] Wetting-dewetting transition line in thin polymer films [J].

Ashley, KM ;

Raghavan, D ;

Douglas, JF ;

Karim, A .

LANGMUIR, 2005, 21 (21) :9518-9523

[3] Nanofabrication of integrated magnetoelectronic devices using patterned self-assembled copolymer templates [J].

Bal, M ;

Ursache, A ;

Tuominen, MT ;

Goldbach, JT ;

Russell, TP .

APPLIED PHYSICS LETTERS, 2002, 81 (18) :3479-3481

[4] Defect-free nanoporous thin films from ABC triblock copolymers [J].

Bang, Joona ;

Kim, Seung Hyun ;

Drockenmuller, Eric ;

Misner, Matthew J. ;

Russell, Thomas P. ;

Hawker, Craig J. .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2006, 128 (23) :7622-7629

[5]

Binder K, 1999, ADV POLYM SCI, V138, P1

[6] Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication [J].

Black, CT ;

Guarini, KW ;

Milkove, KR ;

Baker, SM ;

Russell, TP ;

Tuominen, MT .

APPLIED PHYSICS LETTERS, 2001, 79 (03) :409-411

[7] Solvent annealing thin films of poly(isoprene-b-lactide) [J].

Cavicchi, KA ;

Berthiaume, KJ ;

Russell, TP .

POLYMER, 2005, 46 (25) :11635-11639

[8]

Cheng JY, 2001, ADV MATER, V13, P1174, DOI 10.1002/1521-4095(200108)13:15<1174::AID-ADMA1174>3.0.CO

[9]

2-Q

[10] Interface and surface effects on the glass transition in thin polystyrene films [J].

DeMaggio, GB ;

Frieze, WE ;

Gidley, DW ;

Zhu, M ;

Hristov, HA ;

Yee, AF .

PHYSICAL REVIEW LETTERS, 1997, 78 (08) :1524-1527

← 1 2 3 4 5 →