An intense XUV source of radiation, within the 4-45-nm-spectral range, based on capillary discharge plasmas

被引：10

作者：

Shevelko, AP ^{[1
]}

Knight, LV ^{[1
]}

Turley, RS ^{[1
]}

Yakushev, OF ^{[1
]}

机构：

[1] Russian Acad Sci, PN Lebedev Phys Inst, Opt Div, Moscow 117924, Russia

来源：

APPLICATIONS OF X RAYS GENERATED FROM LASERS AND OTHER BRIGHT SOURCES II | 2001年 / 4504卷

关键词：

capillary discharge plasmas; EUV spectroscopy; reflectometry and lithography;

D O I：

10.1117/12.448459

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A compact device, based on fast capillary discharge plasmas, is an intense EUV and soft x-ray source of radiation. The plasma is created by a discharge of low-inductance capacitors through a gas-filled ceramic capillary (2 mm diameter, 10 mm length). Parameters of the discharge are: maximum cur-rent of 25 kA at applied voltage 40 W, a pulse duration of 20-30 ns at FWHM, and a rise time of 1.5 ns. The soft x-ray and EUV emission of multiply charged ions is investigated using a compact I meter grazing incidence spectrometer-monochromator with a constant angle of deviation. The use of various gases (CO2, Ne, Ar, Kr, Xe) allows the observation of XUV spectra in a wide spectral range 4 45 rim. A Xe-filled capillary discharge shows intense radiation (similar to5 mJ/2pi ster/pulse within a 0.9 nm bandwidth) near 13.5 mn-the region of interest for EUV lithography applications. A reflectometer is used for testing grazing incidence gratings.

引用

页码：143 / 150

页数：8