Impact of Moisture and Fluorocarbon Passivation on the Current Collapse of AlGaN/GaN HEMTs

被引:30
作者
Gao, Feng [1 ]
Chen, Di [2 ]
Lu, Bin [1 ]
Tuller, Harry L. [2 ]
Thompson, Carl V. [2 ]
Keller, Stacia [3 ]
Mishra, Umesh K. [3 ]
Palacios, Tomas [1 ]
机构
[1] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA
[2] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
[3] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
关键词
AlGaN/GaN high-electron-mobility transistors (HEMTs); current collapse; moisture; passivation; POWER PERFORMANCE;
D O I
10.1109/LED.2012.2206556
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, ambient moisture has been identified as a previously unrecognized cause of current collapse in AlGaN/GaN high-electron-mobility transistors. Unpassivated devices exposed to dry air or protected with a hydrophobic passivation, such as vapor-deposited fluorocarbon, showed negligible current collapse under 250-ns pulsed measurements. A mechanism based on the ionization and deionization of the water molecules at the device surface has been proposed to explain this behavior. The use of a hydrophobic passivation to prevent dc-to-RF dispersion works even when it is not directly in contact with the semiconductor surface, which allows the engineering of multistack passivation layers to eliminate current collapse while minimizing parasitic capacitance.
引用
收藏
页码:1378 / 1380
页数:3
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