X-Ray Lithography for Nanofabrication: Is There a Future?

被引：12

作者：

Bharti, Amardeep ^{[1
]}

Turchet, Alessio ^{[1
]}

Marmiroli, Benedetta ^{[2
]}

机构：

[1] Elettra Sincrotrone Trieste, Trieste, Italy

[2] Graz Univ Technol, Inst Inorgan Chem, Graz, Austria

来源：

FRONTIERS IN NANOTECHNOLOGY | 2022年 / 4卷

关键词：

x-ray lithography; nanopatterning; x-ray interference lithography; radiation assisted materials synthesis and processing; nanofabriaction; TOP-DOWN; ELECTRON-BEAM; FILMS; FABRICATION; DEPOSITION; RESOLUTION; RADIATION; EXCHANGE; TITANIA; GLASS;

D O I：

10.3389/fnano.2022.835701

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

X-ray lithography has been first proposed almost 50 years ago, and the related LIGA process around 25 years ago. It is therefore a good time to make an analysis of the technique, with its pros and cons. In this perspective article, we describe X-ray lithography's latest advancements. First, we report the improvement in the fabrication of the high aspect ratio and high-resolution micro/nanostructures. Then, we present the radiation-assisted synthesis and processing of novel materials for the next generation of functional devices. We finally draw our conclusion on the future prospects of the technique.

引用

页数：8

共 50 条

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