Manganese K- and L3-edge X-ray Absorption Fine Structure Study of Zn1-x MnxTe

被引：3
作者：
Zheng, Wei [1 ]
Jang, Ling-Yun
Lee, Jenn-min
Zheng, Rui Sheng [1 ]
Liu, Chee Wee
Becla, P.
Feng, Zhe Chuan
机构：
[1] Shenzhen Univ, Key Lab Optoelect Devices & Syst, Minist Educ & Guangdong Prov, Inst Optoelect, Shenzhen 518060, Peoples R China
来源：
ADVANCES IN CHEMICAL, MATERIAL AND METALLURGICAL ENGINEERING, PTS 1-5 | 2013年 / 634-638卷
关键词：
ZnMnTe; X-ray absorption fine structure; Extended X-ray absorption fine structure; X-ray absorption near-edge structure; SPECTROSCOPY;
D O I：
10.4028/www.scientific.net/AMR.634-638.2489
中图分类号：
TQ [化学工业];
学科分类号：
0817 ;
摘要：
High-resolution synchrotron radiation x-ray absorption data on Mn K- and L-3-edge for semimagnetic semiconductor Zn1-xMnxTe bulk materials are presented. A detailed analysis of the extended x-ray absorption fine structure by using the IFEFFIT program, and the chemical bonds of Mn-Te are obtained. The x-ray absorption near-edge structure of the Mn K- and L-3-edges are investigated, and the electronic structure of Zn1-xMnxTe with various compositions are studied.
引用
收藏
页码：2489 / 2492
页数：4
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