Effects of germanium and nitrogen incorporation on crystallization of N-doped Ge2+xSb2Te5 (x=0,1) thin films for phase-change memory

被引:13
作者
Cheng, Limin [1 ,2 ]
Wu, Liangcai [1 ]
Song, Zhitang [1 ]
Rao, Feng [1 ]
Peng, Cheng [1 ]
Yao, Dongning [1 ]
Liu, Bo [1 ]
Xu, Ling [3 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing 10080, Peoples R China
[3] Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Jiangsu, Peoples R China
基金
中国国家自然科学基金;
关键词
High resolution transmission electron microscopy - Tellurium compounds - Amorphous films - Microstructure - Optical band gaps - X ray photoelectron spectroscopy - Energy gap - Germanium compounds - Antimony compounds - Thin films - Crystalline materials - Nitrogen compounds - Doping (additives) - Nitrogen - X ray diffraction;
D O I
10.1063/1.4789388
中图分类号
O59 [应用物理学];
学科分类号
摘要
The phase-change behavior and microstructure changes of N-doped Ge3Sb2Te5 [N-GST(3/2/5)] and Ge2Sb2Te5 [GST(2/2/5)] films during the phase transition from an amorphous to a crystalline phase were studied using in situ temperature-dependent sheet resistance measurements, X-ray diffraction, and transmission electron microscopy. The optical band gaps of N-GST(3/2/5) films are higher than that of GST(2/2/5) film in both the amorphous and face-centered-cubic (fcc) phases. Ge nitride formation by X-ray photoelectron spectroscopy analysis increased the optical band gap and suppressed crystalline grain growth, resulting in an increase in the crystallization temperature and resistance in the fcc phase. As a result, the Ge- and N-doped GST(2/2/5) composite films can be considered as a promising material for phase-change memory application because of improved thermal stability and reduced power consumption. (C) 2013 American Institute of Physics. [http://dx.doi.org/10.1063/1.4789388]
引用
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页数:5
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