Modeling of radiation-induced defect recovery in 3C-SiC under high field bias conditions

被引:5
|
作者
Peterson, Ricardo [1 ]
Senesky, Debbie [1 ,2 ]
机构
[1] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
[2] Stanford Univ, Dept Aeronaut & Astronaut, Stanford, CA 94305 USA
基金
美国国家科学基金会;
关键词
Molecular dynamics; Radiation; Ensemble Monte Carlo; Silicon carbide; Defect recovery; Single event effects; HEAVY-ION IRRADIATION; MONTE-CARLO; SILICON; DAMAGE; TRANSPORT;
D O I
10.1016/j.commatsci.2019.01.016
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work, the implications of high field bias conditions in radiation-induced defect recovery in 3C-SiC crystals is studied. It is well known that transient heating effects (or thermal spikes) occur when energetic swift heavy ions (SHIs) deposit energy to the surrounding medium via ionization. Here, we explore the dynamics of this transient event under high background electric fields in 3C-SiC, which is what occurs when an ion strike coincides with field-sensitive volumes. In this study, we use the Ensemble Monte Carlo method to quantify how the energy deposition of the ionized regions change in response to high background electric fields. Subsequently, we study the relationship between the radiation-induced thermal spike and defect recovery using molecular dynamics simulations. We find that field strengths below the critical breakdown of wide bandgap devices are sufficient to exacerbate the localized heating, which subsequently enhances the defect recovery effect. This work is beneficial for 3C-SiC electronics and materials used in high radiation environments.
引用
收藏
页码:10 / 15
页数:6
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