Conduction Behaviors of CaBi4Ti4O15 Thin Films Prepared by Using Chemical Solution Deposition

被引:0
|
作者
Kim, Jin Won [1 ]
Kim, Sang Su [1 ]
Yi, Seung Woo [1 ]
Do, Dalhyun [1 ]
机构
[1] Changwon Natl Univ, Dept Phys, Chang Won 641773, South Korea
关键词
CaBi4Ti4O15; thin film; Chemical solution deposition; Electrical properties; Conduction mechanism; FERROELECTRIC PROPERTIES;
D O I
10.3938/jkps.54.835
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The ferroelectric CaBi4Ti4O15 (CBT), all Aurivillius family with n = 4, thin film was prepared on a Pt(111)/Ti/SiO2/Si substrate by using chemical solution deposition followed by rapid thermal annealing at 650 degrees C for 3 min in all oxygen atmosphere. The CBT film was found to be randomly oriented without, any observable secondary phases. The electrical properties of the CBT films were investigated systematically The CBT thin film exhibited a good P-E hysteresis loop with a large remanent polarization (2P(r)) of 54 mu C/cm(2) and a low coercive field (2E(c)) of 168 kV/cm at an electric field of 250 kV/cm. The dielectric constant and the dielectric loss were 390 and 0.028, respectively, at 100 kHz. According to the T-E curves of the CBT thin film, the current conduction mechanisms were found to be dominated by Ohmic and Schottky emission conductions at low and high electric fields, respectively. Furthermore, the values of the pulse polarizations [i.e., +(P* -P<boolean AND>) or -(P* -P<boolean AND>)] of the film were reasonably unchanged up to 1.4 x 10(10) switching cycles.
引用
收藏
页码:835 / 839
页数:5
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