In this letter, we report on the realization of the p-type ZnO film by in situ nitrogen doping and subsequent thermal activation, as well as the discussions on the doping mechanism. Through the high temperature activation, a conversion of conductivity from n- to p-type with a hole concentration of similar to 10(19)/cm(3) has been observed by Hall measurements, accompanied with the formation and dissociation of N-H complex investigated by Raman spectra. These observations provide probability on the passivation effect of N-H complex and dehydrogenation process at high temperature, as confirmed by the variation of N and H atomic concentration in the secondary ion mass spectra. The dehydrogenation process in oxygen ambient at 900 degrees C led to the dissociation of NO-H complexes, resulting in the formation of isolated No acceptors and compensation to the intrinsic donor-like defects. The N-related acceptor bound exciton in photoluminescence with a small binding energy of 100 meV and high p-type conductivity in activated ZnO:N film imply the important role of dehydrogenation effect to the realization of p-type ZnO. (c) 2008 Elsevier B.V. All rights reserved.
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S China Normal Univ, Inst Optoelect Mat & Technol, Guangzhou 510631, Peoples R ChinaS China Normal Univ, Inst Optoelect Mat & Technol, Guangzhou 510631, Peoples R China
Chen Kun
Fan Guang-Han
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S China Normal Univ, Inst Optoelect Mat & Technol, Guangzhou 510631, Peoples R ChinaS China Normal Univ, Inst Optoelect Mat & Technol, Guangzhou 510631, Peoples R China
Fan Guang-Han
Zhang Yong
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S China Normal Univ, Inst Optoelect Mat & Technol, Guangzhou 510631, Peoples R ChinaS China Normal Univ, Inst Optoelect Mat & Technol, Guangzhou 510631, Peoples R China
Zhang Yong
Ding Shao-Feng
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S China Normal Univ, Inst Optoelect Mat & Technol, Guangzhou 510631, Peoples R ChinaS China Normal Univ, Inst Optoelect Mat & Technol, Guangzhou 510631, Peoples R China
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & phys, Key Lab Excited State Proc, Changchun 130033, Peoples R ChinaNE Normal Univ, Ctr Adv Optoelect Funct Mat Res, Changchun 130024, Peoples R China
Xiao, Z. Y.
Liu, Y. C.
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NE Normal Univ, Ctr Adv Optoelect Funct Mat Res, Changchun 130024, Peoples R ChinaNE Normal Univ, Ctr Adv Optoelect Funct Mat Res, Changchun 130024, Peoples R China
Liu, Y. C.
Mu, R.
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Fisk Univ Nashville, Ctr Phys & Chem Mat, Nashville, TN 37208 USANE Normal Univ, Ctr Adv Optoelect Funct Mat Res, Changchun 130024, Peoples R China
Mu, R.
Zhao, D. X.
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & phys, Key Lab Excited State Proc, Changchun 130033, Peoples R ChinaNE Normal Univ, Ctr Adv Optoelect Funct Mat Res, Changchun 130024, Peoples R China
Zhao, D. X.
Zhang, J. Y.
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & phys, Key Lab Excited State Proc, Changchun 130033, Peoples R ChinaNE Normal Univ, Ctr Adv Optoelect Funct Mat Res, Changchun 130024, Peoples R China
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Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R ChinaChinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, Key Lab Excited State Proc, Changchun 130033, Peoples R China
Xiao, Z. Y.
Liu, Y. C.
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Liu, Y. C.
Li, B. H.
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Li, B. H.
Zhang, J. Y.
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Zhang, J. Y.
Zhao, D. X.
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Zhao, D. X.
Lu, Y. M.
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Lu, Y. M.
Shen, D. Z.
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Shen, D. Z.
Fan, X. W.
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City Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R ChinaCity Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
Yuan, G. D.
Zhang, W. J.
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City Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R ChinaCity Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
Zhang, W. J.
Zhang, W. F.
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City Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R ChinaCity Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
Zhang, W. F.
Fan, X.
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City Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R China
Chinese Acad Sci, Tech Inst Phys & Chem, Nanoorgan Photoelect Lab, Beijing 100080, Peoples R ChinaCity Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
Fan, X.
Bello, I.
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City Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R ChinaCity Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
Bello, I.
Lee, C. S.
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City Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R ChinaCity Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
Lee, C. S.
Lee, S. T.
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City Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China
City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Hong Kong, Peoples R ChinaCity Univ Hong Kong, COSDAF, Hong Kong, Hong Kong, Peoples R China