Synthesis of Photocleavable Poly(styrene-block-ethylene oxide) and Its Self-Assembly into Nanoporous Thin Films

被引：150

作者：

Kang, Minhyuck ^{[1
]}

Moon, Bongjin ^{[1
]}

机构：

[1] Sogang Univ, Dept Chem, Seoul 121742, South Korea

来源：

MACROMOLECULES | 2009年 / 42卷 / 01期

关键词：

COPOLYMER TEMPLATES; BLOCK-COPOLYMERS; MEMBRANES; ARRAYS; NANOPARTICLES; POLYSTYRENE;

D O I：

10.1021/ma802434g

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The synthesis of Photocleavable Poly(styrene-block-ethylene oxide) and its self-assembly into Nanoporous thin films by UV irradiation in which a photochemically sensitive ortho-nitrobenzyl (ONB) is installed as a linker, was studied. The preparation of desired ONB-linked PS-b-PEO block copolymer, ONB-(PS-b-PEO), by atom transfer polymerization (ATRP) using a ONB-functional PEO macroinitiator was also carried out. The THF was distilled from sodium benzophene ketyl for the experiment, while dry methylene chloride was obtained from distillation of calcium hydride. he study also investigated the polymerization of styrene by ATRP as the macroinitiator. Several ONB-(PS-b-PEO) block copolymers using ARTP conditions with controlled molecular weight, where each copolymer was cleaved by UV irradiation and narrow polydispersity was also prepared and were analyzed by H NMR spectroscopy.

引用

页码：455 / 458

页数：4

共 46 条

[1] Defect-free nanoporous thin films from ABC triblock copolymers [J].