Preparation and structural characterization of nanostructured iron oxide thin films

被引：24
作者：
Lü, WG
Yang, DQ
Sun, Y
Guo, Y
Xie, SP
Li, HL
机构：
[1] Lanzhou Inst Phys, Lab Appl Surface Phys, Lanzhou 730000, Peoples R China
[2] Lanzhou Univ, Dept Chem, Lanzhou 730000, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 1999年 / 147卷 / 1-4期
关键词：
alpha-Fe2O3; thin films; atomic force microscopy (AFM); X-ray photoelectron spectroscopy (XPS);
D O I：
10.1016/S0169-4332(98)00921-0
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Nanostructured iron oxide thin films were prepared using a dip-coating technique by forced hydrolysis of a FeCl3, solution with 2% gelatin at 60 degrees C. The structural properties were characterized by X-ray diffractometer (XRD), atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and UV-Vis absorption measurements. XRD analysis revealed that the iron oxide in the films consisted of alpha-Fe2O3, AFM showed that the Fe2O3 particles in the films were relatively uniform in size and XPS showed that there was little carbon on the surface and that the Fe2O3 fully covered the Si substrate. The particle sizes can be easily controlled through the pH of the solution. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：39 / 43
页数：5
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