Study of the electrical behavior of nanostructured Ti-Ag thin films, prepared by Glancing Angle Deposition

被引：14
|
作者：
Lopes, C. [1 ,2 ]
Pedrosa, P. [1 ,3 ,4 ]
Martin, N. [5 ]
Barradas, N. P. [6 ]
Alves, E. [7 ]
Vaz, F. [1 ,3 ]
机构：
[1] Univ Minho, Ctr Fis, P-4710057 Braga, Portugal
[2] Inst Pedro Nunes, Lab Ensaios Desgaste & Mat, P-3030199 Coimbra, Portugal
[3] Univ Coimbra, Dept Mech Engn, SEG CEMUC, P-3030788 Coimbra, Portugal
[4] Univ Porto, Fac Engn, Dept Engn Met & Mat, P-4200465 Oporto, Portugal
[5] Univ Franche Comte, CNRS, Inst FEMTO ST, UMR 6174,ENSMM,UTBM, F-25030 Besancon, France
[6] Univ Lisbon, Inst Super Tecn, Ctr Ciencias & Tecnol Nucl, P-2695066 Bobadela, Lrs, Portugal
[7] Univ Lisbon, Inst Super Tecn, Inst Plasmas & Fusao Nucl, P-2695066 Bobadela, Lrs, Portugal
来源：
MATERIALS LETTERS | 2015年 / 157卷
关键词：
GLancing Angle Deposition; Thin films; Intermetallic compounds; Electrical properties; Sensing devices; BIOMEDICAL APPLICATIONS; MICROSTRUCTURE; TITANIUM; EVOLUTION; COATINGS; ALLOYS; GROWTH;
D O I：
10.1016/j.matlet.2015.05.067
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Aiming at biosignal acquisition for bioelectrodes application, Ti-Ag thin films were produced by GLAD, in order to tailor their electromechanical properties. The electrical behavior of the sculptured Ti-Ag thin films was studied with increasing annealing temperatures. The results revealed a good correlation with the set of morphological features displayed. With the increase of the vapor flux angle, a more defined structure was obtained, as well as a more porous morphology, which increased the electrical resistivity of the coatings. An important point consists in the recrystallization of Ti-Ag intermetallic phases due to the temperature increase (between 558 K and 773 K), which resulted in a sharp decrease of the electrical resistivity values. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码：188 / 192
页数：5
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