Step formation on hydrogen-etched 6H-SiC{0001} surfaces

被引:44
作者
Nie, S. [1 ]
Lee, C. D. [1 ]
Feenstra, R. M. [1 ]
Ke, Y. [2 ]
Devaty, R. P. [2 ]
Choyke, W. J. [2 ]
Inoki, C. K. [3 ]
Kuan, T. S. [3 ]
Gu, Gong [4 ]
机构
[1] Carnegie Mellon Univ, Dept Phys, Pittsburgh, PA 15213 USA
[2] Univ Pittsburgh, Dept Phys & Astron, Pittsburgh, PA 15260 USA
[3] SUNY Albany, Dept Phys, Albany, NY 12222 USA
[4] Sarnoff Corp, Princeton, NJ 08543 USA
基金
美国国家科学基金会;
关键词
atomic force microscopy; step formation and bunching; silicon carbide;
D O I
10.1016/j.susc.2008.07.021
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The formation of step bunches and/or facets on hydrogen-etched 6H-SiC(0001) and (000 (1) over bar) surfaces has been studied, using both nominally on-axis and intentionally miscut (i.e. vicinal) substrates. It is found that small miscuts on the (0001) surface produce full unit-cell high steps, while half unit-cell high steps are observed on the (000 (1) over bar) surface. The observed step normal direction is found to be (1 (1) over bar 00) for both surfaces. Hence, for intentionally miscut material, a miscut oriented towards this direction produces much better order in the step array compared to a miscut oriented towards a (11 (2) over bar0) direction. For (0001) vicinal surfaces that are miscut towards the (1 (1) over bar 00) direction, the formation of surface ripples is observed for 31 miscut and the development of small facets (nanofacets) is found for higher miscut angles. Much less faceting is observed on miscut (000 (1) over bar) surfaces. Additionally, the (0001) surface is found to have a much larger spatial anisotropy in step energies than the (000 (1) over bar) surface. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:2936 / 2942
页数:7
相关论文
共 19 条
  • [1] Ordering distance of surface nanofacets on vicinal 4H-SiC(0001)
    Fujii, Masahiro
    Tanaka, Satoru
    [J]. PHYSICAL REVIEW LETTERS, 2007, 99 (01)
  • [2] Nanowires and nanorings at the atomic level -: art. no. 096102
    Kawamura, M
    Paul, N
    Cherepanov, V
    Voigtländer, B
    [J]. PHYSICAL REVIEW LETTERS, 2003, 91 (09)
  • [3] Effect of hydrogen etching on 6H SiC surface morphology studied by reflection high-energy positron diffraction and atomic force microscopy
    Kawasuso, A
    Kojima, K
    Yoshikawa, M
    Itoh, H
    Narumi, K
    [J]. APPLIED PHYSICS LETTERS, 2000, 76 (09) : 1119 - 1121
  • [4] GROWTH-MECHANISM OF 6H-SIC IN STEP-CONTROLLED EPITAXY
    KIMOTO, T
    NISHINO, H
    YOO, WS
    MATSUNAMI, H
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 73 (02) : 726 - 732
  • [5] Kimoto T, 1997, PHYS STATUS SOLIDI B, V202, P247, DOI 10.1002/1521-3951(199707)202:1<247::AID-PSSB247>3.0.CO
  • [6] 2-Q
  • [7] Step bunching mechanism in chemical vapor deposition of 6H- and 4H-SiC{0001}
    Kimoto, T
    Itoh, A
    Matsunami, H
    Okano, T
    [J]. JOURNAL OF APPLIED PHYSICS, 1997, 81 (08) : 3494 - 3500
  • [8] Lee CD, 2002, MRS INTERNET J N S R, V7
  • [9] On the microscopic origin of the kinetic step bunching instability on vicinal Si(001)
    Myslivecek, J
    Schelling, C
    Schäffler, F
    Springholz, G
    Smilauer, P
    Krug, J
    Voigtländer, B
    [J]. SURFACE SCIENCE, 2002, 520 (03) : 193 - 206
  • [10] Self-ordering of nanofacets on vicinal SiC surfaces
    Nakagawa, H
    Tanaka, S
    Suemune, I
    [J]. PHYSICAL REVIEW LETTERS, 2003, 91 (22)