Cylindrical DC magnetron sputtering assisted by microwave plasma

被引：16

作者：

Yonesu, A ^{[1
]}

Kato, T ^{[1
]}

Takemoto, H ^{[1
]}

Nishimura, N ^{[1
]}

Yamashiro, Y ^{[1
]}

机构：

[1] Univ Ryukyus, Fac Engn, Dept Elect & Elect Engn, Nishihara, Okinawa 9030213, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 7B期

关键词：

microwave plasma; magnetron discharge; sputtering deposition; permanent magnets; cylindrical multipoler magnetic field; E x B drift;

D O I：

10.1143/JJAP.38.4326

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new magnetron sputtering apparatus assisted by microwave plasma has been developed to achieve high sputter deposition rates at low gas pressures. In this apparatus, a microwave plasma is produced in a cylindrical multipolar magnetron arrangement. and utilized for DC magnetron sputtering deposition. With the assistance of microwave plasma, operation of the magnetron discharge has been achieved at pressures on the order of 10(-4) Torr. Aluminum films are deposited in this apparatus at rates greater than 50 nm/min even at the low gas pressure of 2.5 x 10(-4) Torr.

引用

页码：4326 / 4328

页数：3

共 8 条

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