Thickness-dependence of magnetic anisotropy and domain structure in Ni thin films grown on a PMN-PT substrate

被引:5
作者
Xiang, Yuanzhi [1 ]
Liang, Kun [1 ,2 ]
Keller, Scott [2 ,3 ]
Guevara, Michael [2 ]
Sheng, Michael [2 ]
Yan, Zhuo [1 ]
Zhou, Peng [1 ]
Qi, Yajun [1 ]
Ma, Zhijun [1 ]
Liu, Ying [1 ,4 ]
Srinivasan, Gopalan [4 ]
Carman, Gregory P. [2 ]
Zhang, Tianjin [1 ]
Lynch, Christopher S. [2 ,3 ]
机构
[1] Hubei Univ, Dept Mat Sci & Engn, Hubei Collaborat Innovat Ctr Adv Organ Chem Mat,H, Key Lab Green Preparat & Applicat Mat,Minist Educ, Wuhan 430062, Peoples R China
[2] Univ Calif Los Angeles, Dept Mech & Aerosp Engn, Los Angeles, CA 90095 USA
[3] Univ Calif Riverside, Dept Mech Engn, Riverside, CA 92521 USA
[4] Oakland Univ, Phys Dept, Rochester, MI 48309 USA
关键词
magnetic anisotropy; thin films; magnetic domain structure; ferromagnetic resonance;
D O I
10.1088/1361-665X/aba53d
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
High-quality Ni ferromagnetic thin films with the thicknesses of 180, 240, 330, and 510 nm +/- 5 nm were grown on (001)Pb(Mg1/3Nb2/3)(0.7)Ti0.3O3(PMN-PT) single-crystal substrates by magnetron sputtering followed by annealing. The thickness dependence of magnetic anisotropy was investigated using ferromagnetic resonance, indicating that the 180 nm Ni thin film exhibits a large magnetic anisotropy field. Increasing the film's thickness resulted in a reduction of the magnetic anisotropy. Well-defined stripe domain structures in Ni thin films were observed. Calculations based on the tilted partial flux closure domain structure with Bloch wall and Neel wall indicate an increase in the primary domain size and closure domain size of Ni thin films with increasing film thickness.
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页数:12
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