Aerosol-assisted chemical vapor deposition of ultra-thin CuOx films as hole transport material for planar perovskite solar cells

被引：18

作者：

Zhang, Zhixin ^{[1
]}

Chen, Shuqun ^{[1
]}

Li, Pingping ^{[1
]}

Li, Hongyi ^{[1
]}

Wu, Junshu ^{[1
]}

Hu, Peng ^{[1
]}

Wang, Jinshu ^{[1
]}

机构：

[1] Beijing Univ Technol, Sch Mat Sci & Engn, Beijing 100124, Peoples R China

来源：

FUNCTIONAL MATERIALS LETTERS | 2018年 / 11卷 / 02期

基金：

中国博士后科学基金; 北京市自然科学基金; 中国国家自然科学基金;

关键词：

Chemical vapor deposition; solar cells; thin films; cooper oxide; HIGHLY EFFICIENT; LAYER; CU2O; CRYSTALLIZATION; PHASE; ANODE;

D O I：

10.1142/S1793604718500352

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This paper reports on the fabrication of CuOx films to be used as hole transporting layer (HTL) in CH3NH3PbI3 perovskite solar cells (PSCs). Ultra-thin CuOx coatings were grown onto FTO substrates for the first time via aerosol-assisted chemical vapor deposition (AACVD) of copper acetylacetonate in methanol. After incorporating into the PSCs prepared at ambient air, a highest power conversion efficiency (PCE) of 8.26% with HTL and of 3.34% without HTL were achieved. Our work represents an important step in the development of low-cost CVD technique for fabricating ultra-thin metal oxide functional layers in thin film photovoltaics.

引用

页数：4

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