Lower friction and higher wear resistance of fluorine-incorporated amorphous carbon films

被引:7
作者
Cui, Jinfeng [1 ]
Qiang, Li [2 ]
Zhang, Bin [2 ]
Yang, Tao [1 ,2 ]
Zhang, Junyan [2 ]
机构
[1] Lanzhou Univ Technol, Sch Petrochem Engn, Lanzhou 730050, Peoples R China
[2] Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
基金
中国国家自然科学基金;
关键词
amorphous hydrogenated carbon films; fluorine doping; fluorine modification; tribological properties; DIAMOND-LIKE CARBON; CHEMICAL-VAPOR-DEPOSITION; SILICON; FABRICATION; COATINGS; PECVD;
D O I
10.1002/sia.5283
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Plasma-enhanced chemical vapor deposition was employed to fabricate hydrogenated amorphous carbon (a-C:H) films and fluorine-doped hydrogenated amorphous (a-C:H:F) carbon films. For comparison purpose, the a-C:H films were treated with CF4 plasma. (3), C-F and C-F-2 groups in both the a-C:H:F film and the surface CF4 plasma processed hydrogenated amorphous carbon (F-P-a-C:H) films. Moreover, the a-C:H:F films, because of the transformation of sp(3) to sp(2), possess a lower friction coefficient than that of the F-P-a-C:H films. Copyright (c) 2013 John Wiley & Sons, Ltd.
引用
收藏
页码:1329 / 1333
页数:5
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